INIS
thin films
97%
zinc oxides
75%
films
67%
doped materials
55%
quantum wells
47%
nonlinear problems
43%
concentration
42%
applications
37%
nanostructures
35%
energy
34%
optical properties
34%
aluminium nitrides
32%
lasers
29%
sputtering
28%
power
27%
deposition
27%
supercapacitors
23%
relaxation
23%
levels
22%
ferrite
22%
surfaces
22%
growth
21%
irradiation
20%
investigations
20%
tunneling
19%
membranes
19%
titanium oxides
19%
substrates
19%
bismuth
19%
layers
18%
performance
18%
electrodes
18%
epitaxy
18%
ferrites
17%
absorption
17%
piezoelectricity
17%
electrons
17%
oxides
16%
size
16%
gallium arsenides
16%
devices
16%
scanning electron microscopy
16%
x-ray diffraction
16%
reviews
15%
electrical properties
15%
temperature range 0273-0400 k
15%
water
15%
magnetrons
15%
gases
15%
oxygen
15%
Material Science
Thin Films
100%
Film
65%
ZnO
64%
Optical Property
35%
Aluminum Nitride
32%
X-Ray Diffraction
32%
Nanostructure
24%
Supercapacitors
20%
Titanium Dioxide
19%
Quantum Well
19%
Microelectromechanical System
16%
Carbon Nanotubes
15%
Crystallite Size
15%
Piezoelectricity
14%
Nanocomposite
14%
Thermoelectrics
14%
Sapphire
14%
Scanning Electron Microscopy
14%
Dielectric Material
13%
Zinc Oxide
13%
Bismuth Ferrite
13%
Magnetron Sputtering
13%
Pulsed Laser Deposition
12%
Nanoparticle
12%
Photoluminescence
12%
Oxygen Vacancy
12%
Structural Property
12%
Molecular Beam Epitaxy
12%
Density
12%
Aluminum
11%
Dielectric Spectroscopy
11%
Capacitance
11%
Nanorods
11%
Annealing
11%
Permittivity
10%
Bismuth
10%
Electrical Resistivity
10%
Solar Cell
9%
Energy Density
9%
Magnetic Property
9%
Indium
9%
Phase Composition
9%
Complementary Metal-Oxide-Semiconductor Device
9%
Lattice Constant
8%
Grain Boundaries
8%
Energy-Dispersive X-Ray Spectroscopy
8%
Morphology
8%
Gallium Arsenide
7%
Carbon Monoxide
7%
Nanofiltration Membrane
7%
Engineering
Thin Films
65%
Quantum Well
43%
Energy Engineering
21%
Continuous Wave
18%
Band Gap
16%
Resonant Tunneling
15%
Nanomaterial
15%
Structural Property
13%
Nonlinear Absorption
13%
Nanoparticles
13%
Ray Diffraction
13%
Deposited Film
13%
Nonlinearity
13%
Aluminium Gallium Arsenide
13%
Gallium Arsenide
13%
Magnetic Field
13%
Oxygen Vacancy
12%
Magnetron
12%
Room Temperature
12%
Glass Substrate
12%
Nitride
11%
Optical Phonon
11%
Atomic Force Microscopy
10%
Beam Irradiation
9%
Crystallite Size
9%
Nonlinear Refractive Index
9%
Electric Field
9%
Piezoelectric
8%
Optical Power
8%
Photocurrent
7%
Solar Cell
7%
Oxide Film
7%
Sensor Response
7%
Nanorods
7%
Growth Temperature
5%
Sapphire Substrate
5%
Sol-Gel Process
5%
Polysulfone
5%
Thermal Behavior
5%
Pulsed Laser
5%
Titanium Dioxide (Tio2)
5%
Absorptivity
5%
Annealing Temperature
5%
Rich Condition
5%
Radio Frequency
5%
Preferred Orientation
5%
Refractive Index Change
5%
Ray Photoelectron Spectroscopy
5%
Laser Beams
5%
Phase Composition
5%