Characterization and optimization of junctionless gate-all-around vertically stacked nanowire FETs for sub-5 nm technology nodes

V. Bharath Sreenivasulu*, Vadthiya Narendar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

67 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Characterization and optimization of junctionless gate-all-around vertically stacked nanowire FETs for sub-5 nm technology nodes'. Together they form a unique fingerprint.

INIS

Material Science

Chemical Engineering

Engineering