Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique

Neha Sharma; N. Kumar; B. Sundaravel; Kalpataru Panda; Wang David; M. Kamarrudin; S. Dash; B. K. Panigrahi; A. K. Tyagi; I. Nan Lin; Baldev Raj

doi:10.1016/j.triboint.2011.03.028

Effect of CH₄/H₂ plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique

Neha Sharma, N. Kumar^*, B. Sundaravel, Kalpataru Panda, Wang David, M. Kamarrudin, S. Dash, B. K. Panigrahi, A. K. Tyagi, I. Nan Lin, Baldev Raj

^*Corresponding author for this work

Department of Physics, Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H₂ content in CH₄/H ₂ plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH₄ plasma, the I _D/I_G ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.

Original language	English
Pages (from-to)	980-986
Number of pages	7
Journal	Tribology International
Volume	44
Issue number	9
DOIs	https://doi.org/10.1016/j.triboint.2011.03.028
Publication status	Published - 08-2011

All Science Journal Classification (ASJC) codes

Mechanics of Materials
Mechanical Engineering
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.triboint.2011.03.028

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title = "Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique",

abstract = "Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H 2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the I D/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.",

author = "Neha Sharma and N. Kumar and B. Sundaravel and Kalpataru Panda and Wang David and M. Kamarrudin and S. Dash and Panigrahi, {B. K.} and Tyagi, {A. K.} and Lin, {I. Nan} and Baldev Raj",

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language = "English",

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T1 - Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique

AU - Sharma, Neha

AU - Kumar, N.

AU - Sundaravel, B.

AU - Panda, Kalpataru

AU - David, Wang

AU - Kamarrudin, M.

AU - Dash, S.

AU - Panigrahi, B. K.

AU - Tyagi, A. K.

AU - Lin, I. Nan

AU - Raj, Baldev

PY - 2011/8

Y1 - 2011/8

N2 - Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H 2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the I D/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.

AB - Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H 2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the I D/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.

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VL - 44

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JO - Tribology International

JF - Tribology International

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ER -

Effect of CH₄/H₂ plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique

Abstract

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