Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

Dhruva Kumar; Ranjan Kr Ghadai; Soham Das; Ashis Sharma; Bibhu P. Swain

doi:10.1007/s12034-019-1937-7

Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

Dhruva Kumar
, Ranjan Kr Ghadai
, Soham Das
, Ashis Sharma
, Bibhu P. Swain^*

^*Corresponding author for this work

Department of Mechanical & Industrial Engineering Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different N ₂ flow rates using SiC and Si ₃N ₄ powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the I_D/ I_G ratio with an increase in the N ₂ flow rate indicated the increase of sp ³ bonds in the SiCN thin film. The hardness (H), Young’s modulus (E), plasticity index (H / E) and (H³/ E²) increase with an increase in the N ₂ flow rate.

Original language	English
Article number	251
Journal	Bulletin of Materials Science
Volume	42
Issue number	5
DOIs	https://doi.org/10.1007/s12034-019-1937-7
Publication status	Published - 01-10-2019

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials

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Cite this

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title = "Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films",

abstract = "Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different N 2 flow rates using SiC and Si 3N 4 powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the ID/ IG ratio with an increase in the N 2 flow rate indicated the increase of sp 3 bonds in the SiCN thin film. The hardness (H), Young{\textquoteright}s modulus (E), plasticity index (H / E) and (H3/ E2) increase with an increase in the N 2 flow rate.",

author = "Dhruva Kumar and Ghadai, \{Ranjan Kr\} and Soham Das and Ashis Sharma and Swain, \{Bibhu P.\}",

note = "Publisher Copyright: {\textcopyright} 2019, Indian Academy of Sciences.",

year = "2019",

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day = "1",

doi = "10.1007/s12034-019-1937-7",

language = "English",

volume = "42",

journal = "Bulletin of Materials Science",

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TY - JOUR

T1 - Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

AU - Kumar, Dhruva

AU - Ghadai, Ranjan Kr

AU - Das, Soham

AU - Sharma, Ashis

AU - Swain, Bibhu P.

PY - 2019/10/1

Y1 - 2019/10/1

N2 - Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different N 2 flow rates using SiC and Si 3N 4 powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the ID/ IG ratio with an increase in the N 2 flow rate indicated the increase of sp 3 bonds in the SiCN thin film. The hardness (H), Young’s modulus (E), plasticity index (H / E) and (H3/ E2) increase with an increase in the N 2 flow rate.

AB - Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different N 2 flow rates using SiC and Si 3N 4 powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the ID/ IG ratio with an increase in the N 2 flow rate indicated the increase of sp 3 bonds in the SiCN thin film. The hardness (H), Young’s modulus (E), plasticity index (H / E) and (H3/ E2) increase with an increase in the N 2 flow rate.

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U2 - 10.1007/s12034-019-1937-7

DO - 10.1007/s12034-019-1937-7

M3 - Article

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VL - 42

JO - Bulletin of Materials Science

JF - Bulletin of Materials Science

IS - 5

M1 - 251

ER -

Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

Abstract

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