Effect of post-deposition annealing on the properties of ZnO films obtained by high temperature, micro-controller based SILAR deposition

V. K. Ashith; Gowrish K. Rao; Sahana N. Moger; Smitha R

doi:10.1016/j.ceramint.2018.03.097

Effect of post-deposition annealing on the properties of ZnO films obtained by high temperature, micro-controller based SILAR deposition

V. K. Ashith, Gowrish K. Rao, Sahana N. Moger, Smitha R

Department of Physics, Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

The ZnO thin films were prepared by successive ionic layer adsorption and reaction (SILAR) method at elevated precursor temperature. The films were later subjected to post-deposition annealing at different temperatures. This annealing process was found to be beneficial as it improved the structural and optical properties of the films. The ZnO films obtained by SILAR were found to be polycrystalline with hexagonal crystal structure. The crystallite size of the films increased considerably after annealing. The annealed films also showed very high absorption in UV region with marginal change in band gap. Both the crystallite size and optical absorbance were found to increase proportionately with the annealing temperature.

Original language	English
Pages (from-to)	10669-10676
Number of pages	8
Journal	Ceramics International
Volume	44
Issue number	9
DOIs	https://doi.org/10.1016/j.ceramint.2018.03.097
Publication status	Published - 15-06-2018

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Process Chemistry and Technology
Surfaces, Coatings and Films
Materials Chemistry

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title = "Effect of post-deposition annealing on the properties of ZnO films obtained by high temperature, micro-controller based SILAR deposition",

abstract = "The ZnO thin films were prepared by successive ionic layer adsorption and reaction (SILAR) method at elevated precursor temperature. The films were later subjected to post-deposition annealing at different temperatures. This annealing process was found to be beneficial as it improved the structural and optical properties of the films. The ZnO films obtained by SILAR were found to be polycrystalline with hexagonal crystal structure. The crystallite size of the films increased considerably after annealing. The annealed films also showed very high absorption in UV region with marginal change in band gap. Both the crystallite size and optical absorbance were found to increase proportionately with the annealing temperature.",

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AU - Moger, Sahana N.

AU - R, Smitha

PY - 2018/6/15

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AB - The ZnO thin films were prepared by successive ionic layer adsorption and reaction (SILAR) method at elevated precursor temperature. The films were later subjected to post-deposition annealing at different temperatures. This annealing process was found to be beneficial as it improved the structural and optical properties of the films. The ZnO films obtained by SILAR were found to be polycrystalline with hexagonal crystal structure. The crystallite size of the films increased considerably after annealing. The annealed films also showed very high absorption in UV region with marginal change in band gap. Both the crystallite size and optical absorbance were found to increase proportionately with the annealing temperature.

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Effect of post-deposition annealing on the properties of ZnO films obtained by high temperature, micro-controller based SILAR deposition

Abstract

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