Electron bunch charge enhancement in laser wakefield acceleration using a flattened Gaussian laser pulse

We demonstrate the charge enhancement of the electron bunch using a flattened Gaussian laser pulse in laser wakefield accelerations. In laser wakefield accelerations, the change in laser pulse shape affects the diffraction pattern, resulting in laser intensity variation during plasma interaction. We employ a flattened Gaussian laser pulse to excite wakefields for electron acceleration. The central flattened region of the flattened Gaussian laser pulse, having the same energy as the Gaussian pulse, helps to enhance the pulse intensity via self-focusing. Thus, the evolution of flat Gaussian pulse enhances self-injection, which leads a considerable amount of electrons into the accelerating fields. A linear theoretical model is adopted to understand the wakefield generation mechanism using Gaussian and flattened Gaussian pulses. In order to broaden our understanding, quasi-three-dimensional PIC simulations are also performed. Our results show that a flattened Gaussian laser pulse with N=2 (where N is the order of the super Gaussian shape) yields a good quality electron bunch with retaining a relatively higher charge (about 300 pC) with respect to the case of a Gaussian laser pulse. We also show a twofold increase in bunch peak current when a flattened Gaussian pulse is employed. The electron bunches with high charge and high current may be promising candidates to drive next-generation compact free-electron lasers with unique X-ray properties.