Fabrication and characterization of thermal evaporated n-Si/ p-ZnTe thin film heterojunction diodes

Gowrish K. Rao*, Kasturi V. Bangera, G. K. Shivakumar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

The paper reports the fabrication and detailed electrical characterization of thermal evaporated n-Si/p-ZnTe thin film heterojunction diodes. The heterojunction diodes were prepared by depositing ZnTe films on n-Si substrates. The conduction mechanism, barrier height, space charge density and width of the depletion region were determined by I-V and C-V characteristics of the heterojunction diodes. The bandgap and activation energies of n-Si and p-ZnTe were also determined and a theoretical band diagram of n-Si/p-ZnTe heterojunction was drawn based on Anderson's model.

Original languageEnglish
Pages (from-to)298-301
Number of pages4
JournalCurrent Applied Physics
Volume13
Issue number1
DOIs
Publication statusPublished - 01-01-2013

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'Fabrication and characterization of thermal evaporated n-Si/ p-ZnTe thin film heterojunction diodes'. Together they form a unique fingerprint.

Cite this