TY - JOUR
T1 - Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering
AU - Nagaraja, K. K.
AU - Kumar, A. Santhosh
AU - Nagaraja, H. S.
N1 - Publisher Copyright:
© Published under licence by IOP Publishing Ltd.
PY - 2015/1/1
Y1 - 2015/1/1
N2 - The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 Ω/sq with optical transmittance upto 65% were obtained at room temperature.
AB - The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 Ω/sq with optical transmittance upto 65% were obtained at room temperature.
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U2 - 10.1088/1757-899X/73/1/012071
DO - 10.1088/1757-899X/73/1/012071
M3 - Conference article
AN - SCOPUS:84923253721
SN - 1757-8981
VL - 73
JO - IOP Conference Series: Materials Science and Engineering
JF - IOP Conference Series: Materials Science and Engineering
IS - 1
M1 - 012071
T2 - International Conference on Materials Science and Technology, ICMST 2012
Y2 - 10 June 2012 through 14 June 2012
ER -