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Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering

  • K. K. Nagaraja*
  • , A. Santhosh Kumar
  • , H. S. Nagaraja
  • *Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    Abstract

    The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 Ω/sq with optical transmittance upto 65% were obtained at room temperature.

    Original languageEnglish
    Article number012071
    JournalIOP Conference Series: Materials Science and Engineering
    Volume73
    Issue number1
    DOIs
    Publication statusPublished - 01-01-2015
    EventInternational Conference on Materials Science and Technology, ICMST 2012 - Kerala, India
    Duration: 10-06-201214-06-2012

    All Science Journal Classification (ASJC) codes

    • General Materials Science
    • General Engineering

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