Fabrication of photonic crystal line defect waveguides by use of optical lithography and focused ion beam

  • Hemant Sankar Dutta*
  • , Amit Kumar Goyal
  • , Sumitra Singh
  • , Mandeep Kaur
  • , Sudhir Husale
  • , Suchandan Pal
  • *Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Citations (Scopus)

    Abstract

    A fabrication strategy for realizing photonic crystal structures with long interfacing waveguide has been reported. The technique utilizes a combination of optical lithography and focused ion beam milling to fabricate the device.

    Original languageEnglish
    Title of host publicationInternational Conference on Fibre Optics and Photonics, Photonics 2016
    PublisherOptica Publishing Group (formerly OSA)
    ISBN (Print)9781943580224
    DOIs
    Publication statusPublished - 2016
    EventInternational Conference on Fibre Optics and Photonics, Photonics 2016 - Kanpur, India
    Duration: 04-12-201608-12-2016

    Publication series

    NameOptics InfoBase Conference Papers
    ISSN (Electronic)2162-2701

    Conference

    ConferenceInternational Conference on Fibre Optics and Photonics, Photonics 2016
    Country/TerritoryIndia
    CityKanpur
    Period04-12-1608-12-16

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Mechanics of Materials

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