Ferroelectric Negative-Capacitance-Assisted Phase-Transition Field-Effect Transistor

Sameer Yadav*, Pranshoo Upadhyay, Bhaskar Awadhiya, Pravin N. Kondekar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

An enormous study is being carried out in the field of emerging steep slope devices, specifically on negative-capacitance-based and phase transition-based devices. This article investigates the action of ferroelectric (FE) and phase transition material (PTM) on a hybrid device, negative-capacitance-assisted phase transition FinFET (NC-PT-FinFET). We encounter several unique phenomena resulting from this unified action and provide valid arguments based on these observations. A significant enhancement in the differential gain and transconductance, a unique variation in the effect of PTM on drain-channel coupling, tunability of hysteresis across PTM by FE thickness(<inline-formula> <tex-math notation="LaTeX">{t}_{text {fe}} </tex-math></inline-formula>), and ultralow subthreshold slope (SS) by lowering both of its factors are some of the major outcomes of the NC-PT-FinFET. Focus is built on comprehending the individual role of FE and PTM in the intriguing features observed in every device performance parameter with the help of mathematical expressions and physical interpretations. Various tunable parameters present in this hybrid device widen its applicability in digital and memory applications.

Original languageEnglish
Pages (from-to)863-869
Number of pages7
JournalIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Volume69
Issue number2
DOIs
Publication statusPublished - 01-02-2022

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Acoustics and Ultrasonics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Ferroelectric Negative-Capacitance-Assisted Phase-Transition Field-Effect Transistor'. Together they form a unique fingerprint.

Cite this