Hydrogen termination of CVD diamond films by high-temperature annealing at atmospheric pressure

V. Seshan, D. Ullien, A. Castellanos-Gomez, S. Sachdeva, D. H.K. Murthy, T. J. Savenije, H. A. Ahmad, T. S. Nunney, S. D. Janssens, K. Haenen, M. Nesládek, H. S.J. Van Der Zant, E. J.R. Sudhölter, L. C.P.M. De Smet

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20 Citations (Scopus)


A high-temperature procedure to hydrogenate diamond films using molecular hydrogen at atmospheric pressure was explored. Undoped and doped chemical vapour deposited (CVD) polycrys-talline diamond films were treated according to our annealing method using a H2 gas flow down to ∼50 ml/min (STP) at ∼850°C. The films were extensively evaluated by surface wettability, electron affinity, elemental composition, photoconductivity, and redox studies. In addition, electrografting experiments were performed. The surface characteristics as well as the optoelectronic and redox properties of the annealed films were found to be very similar to hydrogen plasma-treated films. Moreover, the presented method is compatible with atmospheric pressure and provides a low-cost solution to hydrogenate CVD diamond, which makes it interesting for industrial applications. The plausible mechanism for the hydrogen termination of CVD diamond films is based on the formation of surface carbon dangling bonds and carbon-carbon unsaturated bonds at the applied temperature, which react with molecular hydrogen to produce a hydrogen-terminated surface.

Original languageEnglish
Article number234707
JournalJournal of Chemical Physics
Issue number23
Publication statusPublished - 21-06-2013

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry


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