TY - GEN
T1 - Improved structural and optical behaviour of InAs Stranski-Krastanov (SK) quantum dot heterostructures using analog, digital, and linear alloy techniques
AU - Kumar, Ajay
AU - Prabhu, Sudheendra
AU - Kumar, Ravindra
AU - Chakrabarti, Subhananda
N1 - Funding Information:
Financial support was provided by DST Nano Mission (Grant number: SR/NM/NS 1178/2015(G)), SERB (Grant number: EMR/2016/005338), DST-SERI (Grant number: DST/TMC/SERI/FR/117(G)), Indian Space Research Organization (Grant number: 09SUBH001), and Abdul Kalam Technology Innovation National Fellowship (INAE/121/AKF). The authors acknowledge the Department of Information and Technology, Centre of Excellence in Nanoelectronics (CEN), National Center of Excellence in Technology for Internal Security (NCETIS), Indian Institute of Technology Bombay Nanofabrication Facility (IITBNF). Nextnano is also acknowledged.
Publisher Copyright:
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PY - 2022
Y1 - 2022
N2 - In this study, we minimize the strain by using the new technique called linear alloy technique (LAT) for the Stranski-Krastanov (SK) quantum dot heterostructure. Here, three different SK InAs QDs heterostructures with 6 nm thick capping layer (CL) having InxGa1-xAs as capping material have been simulated using the 8-band k.p. model-based Nextnano software. Here, the first sample is analog alloyed SK QDs heterostructure having In0.15Ga0.85As capping (Sample A1), the second sample is digital alloyed SK QDs heterostructure where CL is divided into three sub-layers each of 2nm thickness with indium composition varied from 45-30-15% (Sample D1), and the third sample is linear alloyed SK QDs heterostructure where indium composition is varied from 45% to 15% (Sample L1) in a linear fashion, have been studied. The biaxial and hydrostatic strain is computed for all three heterostructures and compared. The biaxial strain is improved by 2.03% and 2.0%, and hydrostatic strain is reduced by 3.49% and 0.071% inside the QD region of sample L1 compared with samples A1 and D1, respectively. Additionally, digital sample D1 offers a step-wise strain reduction inside CL compared to analog sample A1. However, sample L1 offers an even more relaxed strain inside CL than samples A1 and D1, respectively. The PL emission wavelength is observed at 1317, 1372, and 1379 nm for samples A1, D1, and L1, respectively. Hence the linear alloy technique is useful for making future optoelectronic devices where strain reduction is the main factor.
AB - In this study, we minimize the strain by using the new technique called linear alloy technique (LAT) for the Stranski-Krastanov (SK) quantum dot heterostructure. Here, three different SK InAs QDs heterostructures with 6 nm thick capping layer (CL) having InxGa1-xAs as capping material have been simulated using the 8-band k.p. model-based Nextnano software. Here, the first sample is analog alloyed SK QDs heterostructure having In0.15Ga0.85As capping (Sample A1), the second sample is digital alloyed SK QDs heterostructure where CL is divided into three sub-layers each of 2nm thickness with indium composition varied from 45-30-15% (Sample D1), and the third sample is linear alloyed SK QDs heterostructure where indium composition is varied from 45% to 15% (Sample L1) in a linear fashion, have been studied. The biaxial and hydrostatic strain is computed for all three heterostructures and compared. The biaxial strain is improved by 2.03% and 2.0%, and hydrostatic strain is reduced by 3.49% and 0.071% inside the QD region of sample L1 compared with samples A1 and D1, respectively. Additionally, digital sample D1 offers a step-wise strain reduction inside CL compared to analog sample A1. However, sample L1 offers an even more relaxed strain inside CL than samples A1 and D1, respectively. The PL emission wavelength is observed at 1317, 1372, and 1379 nm for samples A1, D1, and L1, respectively. Hence the linear alloy technique is useful for making future optoelectronic devices where strain reduction is the main factor.
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U2 - 10.1117/12.2610102
DO - 10.1117/12.2610102
M3 - Conference contribution
AN - SCOPUS:85131240954
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Physics and Simulation of Optoelectronic Devices XXX
A2 - Witzigmann, Bernd
A2 - Osinski, Marek
A2 - Arakawa, Yasuhiko
PB - SPIE
T2 - Physics and Simulation of Optoelectronic Devices XXX 2022
Y2 - 20 February 2022 through 24 February 2022
ER -