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Improved structural quality of GaN nanowall network grown on pre-nitrided c-sapphire

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    In the present study, GaN nanowall network (NWN) structures are grown using rf-plasma assisted molecular beam epitaxy (PA-MBE) system under highly nitrogen rich conditions over nitrided and bare c-plane sapphire substrates. Nitridation is carried out prior to growth for two of the samples and its effect on the crystal quality of the resultant nanowall structure is studied and compared with the same structure grown on bare sapphire. It is found that nitriding the c-plane sapphire prior to growth results in an improvement of crystalline quality of the resulting nanowall as observed by the reduction in FWHM of (0002) XRC.

    Original languageEnglish
    Title of host publication2014 IEEE 2nd International Conference on Emerging Electronics
    Subtitle of host publicationMaterials to Devices, ICEE 2014 - Conference Proceedings
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    ISBN (Electronic)9781467365277
    DOIs
    Publication statusPublished - 01-01-2014
    Event2014 2nd IEEE International Conference on Emerging Electronics, ICEE 2014 - Bengaluru, India
    Duration: 03-12-201406-12-2014

    Publication series

    Name2014 IEEE 2nd International Conference on Emerging Electronics: Materials to Devices, ICEE 2014 - Conference Proceedings

    Conference

    Conference2014 2nd IEEE International Conference on Emerging Electronics, ICEE 2014
    Country/TerritoryIndia
    CityBengaluru
    Period03-12-1406-12-14

    All Science Journal Classification (ASJC) codes

    • Electrical and Electronic Engineering

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