Skip to main navigation
Skip to search
Skip to main content
Manipal Academy of Higher Education, Manipal, India Home
Help & FAQ
Home
Profiles
Research units
Research output
Equipment
Search by expertise, name or affiliation
Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition
Ranjan Kumar Ghadai
, Kamaraj Logesh
, Robert Čep
, Jasgurpreet Singh Chohan
, Kanak Kalita
*
*
Corresponding author for this work
School of Mechanical Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
13
Citations (Scopus)
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
INIS
deposition
100%
synthesis
100%
coatings
100%
thin films
100%
chemical vapor deposition
100%
titanium nitrides
100%
electrodes
50%
microscopes
50%
surfaces
33%
atomic force microscopy
33%
substrates
33%
roughness
33%
increasing
16%
morphology
16%
particles
16%
mechanical properties
16%
silicon
16%
young modulus
16%
cracks
16%
surface properties
16%
atmospheric pressure
16%
Material Science
Titanium
100%
Nitride Compound
100%
Chemical Vapor Deposition
100%
Thin Film Coating
100%
Nanoindentation
40%
Surface Roughness
40%
Mechanical Property
20%
Energy-Dispersive X-Ray Spectroscopy
20%
Young's Modulus
20%
Silicon
20%
Nanohardness
20%
Surface (Surface Science)
20%
Thin Films
20%
Morphology
20%