Influence of Hf precursor concentration on various properties of sol-gel based spin coated HfO₂ thin films

INIS

• concentration 100%
• thin films 100%
• films 100%
• spin 100%
• precursor 100%
• sol-gel process 100%
• oxygen 20%
• surfaces 20%
• hafnium 20%
• thickness 10%
• applications 10%
• glass 10%
• comparative evaluations 10%
• range 10%
• values 10%
• industry 10%
• morphology 10%
• wavelengths 10%
• xrd 10%
• chemical properties 10%
• substrates 10%
• piezoelectricity 10%
• annealing 10%
• optical properties 10%
• transparency 10%
• mapping 10%
• sols 10%
• monoclinic lattices 10%
• roughness 10%
• dielectric materials 10%
• afm 10%
• xps 10%
• energy storage 10%
• silicon oxides 10%
• grain size 10%
• spin-on coating 10%
• sodium carbonates 10%
• hafnium oxides 10%

Engineering

• Thin Films 100%
• Piezoelectric 50%
• Film Surface 50%
• Dielectrics 50%
• Monoclinic 50%
• Energy Storage 50%
• Crystallinity 50%
• Electronics Industry 50%
• Insulating Material 50%
• Lime Glass 50%
• Silicon Dioxide (Sio2) 50%
• Energy dispersive spectrometry 50%
• Glass Substrate 50%

Material Science

• Film 100%
• Sol-Gel 100%
• Thin Films 100%
• Hafnium 33%
• Surface (Surface Science) 22%
• Chemical Property 11%
• Silicon Dioxide 11%
• Piezoelectricity 11%
• X-Ray Diffraction 11%
• Energy-Dispersive X-Ray Spectroscopy 11%
• Spin Coating 11%
• Grain Size 11%
• Oxide Compound 11%
• Morphology 11%
• Dielectric Material 11%
• Insulation 11%