Insight into Threshold Voltage and Drain Induced Barrier Lowering in Negative Capacitance Field Effect Transistor

Bhaskar Awadhiya, Pravin N. Kondekar, Sameer Yadav, Pranshoo Upadhyay

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

In this paper, we have discussed threshold voltage and drain induced barrier lowering in NCFET. Threshold voltage in NCFET is lower as compared to MOSFET which is mainly because of negative equivalent oxide capacitance in NCFET. Further, we have discussed drain induced barrier lowering in NCFET and MOSFET. An increase in drain bias in MOSFET leads to decrease in threshold voltage and an increase in leakage current whereas in NCFET increase in drain bias leads to increase in threshold voltage and decrease in leakage current. We have obtained a positive value of DIBL factor for MOSFET and negative value for NCFET.

Original languageEnglish
Pages (from-to)267-273
Number of pages7
JournalTransactions on Electrical and Electronic Materials
Volume22
Issue number3
DOIs
Publication statusPublished - 06-2021

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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