Abstract
This chapter offers a foundational overview of nanostructured thin films and the sputtering process, detailing essential concepts, applications, and potential future developments. Beginning with a historical overview, it underscores the evolution of thin films within materials science, accentuating the increasing significance of nanostructured variations. This chapter aims to elucidate the core concepts, classifications, and applications associated with nanostructured thin films and sputtering techniques. An understanding of thin films is fundamental to the discourse, encompassing their characterization, attributes, and various classifications such as organic, inorganic, and hybrid types. The extensive applicability of microelectronics and optics is underscored by their implementation across various industries. Nanostructured materials, characterized by unique properties and fabrication methods, are the subject of thorough investigation, often accompanied by illustrative case studies that enhance the understanding of thin films. The sputtering technique serves as an essential method in the fabrication of thin films. The process entails the application of material onto a surface through the utilization of high-energy particles. This method has undergone thorough examination and is backed by historical data and core principles. The document offers a detailed overview of various sputtering processes, highlighting both their benefits and drawbacks. This establishes a foundation for an in-depth examination of the process and its parameters. This chapter expands its focus to include various applications of nanostructured thin films, spanning electronics, medicine, biotechnology, and environmental sectors. The importance of thorough analysis is highlighted as we explore the essential methods employed to assess the quality and characteristics of films. The chapter acknowledges the current challenges and delineates future directions, offering insightful viewpoints on emerging trends and potential developments. In summary, it encapsulates essential elements, emphasizing the significant role of nanostructured thin films and sputtering in advancing technology, while offering final reflections on their continued importance and potential for future developments.
| Original language | English |
|---|---|
| Title of host publication | Nanostructured Thin Film Deposition by Sputtering |
| Subtitle of host publication | From Fundamentals to Applications |
| Publisher | Elsevier |
| Pages | 87-142 |
| Number of pages | 56 |
| ISBN (Electronic) | 9780443298929 |
| ISBN (Print) | 9780443298936 |
| DOIs | |
| Publication status | Published - 01-01-2025 |
All Science Journal Classification (ASJC) codes
- General Engineering
- General Materials Science
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