Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films

Soham Das; Spandan Guha; Ranjan Ghadai; Dhruva Kumar; Bibhu P. Swain

doi:10.1088/1757-899X/377/1/012178

Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films

Soham Das
, Spandan Guha
, Ranjan Ghadai
, Dhruva Kumar
, Bibhu P. Swain

Department of Mechanical & Industrial Engineering Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Conference article › peer-review

11 Citations (Scopus)

Abstract

Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO₂) powder, Al powder (99% pure) and N₂ gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm^-1and 552.63-815.23 cm^-1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al₂O₃, N-Al, TiO₂ Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.

Original language	English
Article number	012178
Journal	IOP Conference Series: Materials Science and Engineering
Volume	377
Issue number	1
DOIs	https://doi.org/10.1088/1757-899X/377/1/012178
Publication status	Published - 13-07-2018
Event	1st International Conference on Mechanical, Materials and Renewable Energy, ICMMRE 2017 - Majitar, East Sikkim, India Duration: 08-12-2017 → 10-12-2017

All Science Journal Classification (ASJC) codes

General Materials Science
General Engineering

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10.1088/1757-899X/377/1/012178

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@article{45ecaef5b45f488dbb9286379be1902b,

title = "Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films",

abstract = "Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO2) powder, Al powder (99\% pure) and N2 gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm-1and 552.63-815.23 cm-1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al2O3, N-Al, TiO2 Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.",

author = "Soham Das and Spandan Guha and Ranjan Ghadai and Dhruva Kumar and Swain, \{Bibhu P.\}",

note = "Publisher Copyright: {\textcopyright} Published under licence by IOP Publishing Ltd.; 1st International Conference on Mechanical, Materials and Renewable Energy, ICMMRE 2017 ; Conference date: 08-12-2017 Through 10-12-2017",

year = "2018",

month = jul,

day = "13",

doi = "10.1088/1757-899X/377/1/012178",

language = "English",

volume = "377",

journal = "IOP Conference Series: Materials Science and Engineering",

issn = "1757-8981",

publisher = "IOP Publishing Ltd.",

number = "1",

}

TY - JOUR

T1 - Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films

AU - Das, Soham

AU - Guha, Spandan

AU - Ghadai, Ranjan

AU - Kumar, Dhruva

AU - Swain, Bibhu P.

N1 - Publisher Copyright: © Published under licence by IOP Publishing Ltd.

PY - 2018/7/13

Y1 - 2018/7/13

N2 - Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO2) powder, Al powder (99% pure) and N2 gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm-1and 552.63-815.23 cm-1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al2O3, N-Al, TiO2 Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.

AB - Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO2) powder, Al powder (99% pure) and N2 gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm-1and 552.63-815.23 cm-1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al2O3, N-Al, TiO2 Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.

UR - https://www.scopus.com/pages/publications/85050489991

UR - https://www.scopus.com/pages/publications/85050489991#tab=citedBy

U2 - 10.1088/1757-899X/377/1/012178

DO - 10.1088/1757-899X/377/1/012178

M3 - Conference article

AN - SCOPUS:85050489991

SN - 1757-8981

VL - 377

JO - IOP Conference Series: Materials Science and Engineering

JF - IOP Conference Series: Materials Science and Engineering

IS - 1

M1 - 012178

T2 - 1st International Conference on Mechanical, Materials and Renewable Energy, ICMMRE 2017

Y2 - 8 December 2017 through 10 December 2017

ER -

Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films

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