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Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films
Soham Das
, Spandan Guha
,
Ranjan Ghadai
, Dhruva Kumar
, Bibhu P. Swain
School of Mechanical Engineering
Research output
:
Contribution to journal
›
Conference article
›
peer-review
11
Citations (Scopus)
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INIS
thin films
100%
titanium
100%
chemical vapor deposition
100%
aluminium nitrides
100%
range
40%
deposition
40%
scanning electron microscopy
40%
powders
40%
titanium oxides
40%
x-ray photoelectron spectroscopy
40%
raman spectroscopy
20%
spectra
20%
peaks
20%
coatings
20%
processing
20%
films
20%
images
20%
phonons
20%
optics
20%
gases
20%
acoustics
20%
oxides
20%
atmospheric pressure
20%
Material Science
Titanium
100%
Structural Property
100%
Aluminum Nitride
100%
Chemical Vapor Deposition
100%
Thin Films
100%
Morphology
100%
Scanning Electron Microscopy
50%
X-Ray Photoelectron Spectroscopy
50%
Titanium Dioxide
50%
Film
25%
Al2O3
25%
Raman Spectroscopy
25%
Thin Film Coating
25%
Oxide Compound
25%