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Optical Control of Ferroelectric Imprint in BiFeO
3
Haoze Zhang
, Malur C. Nagashree
, Richard F. Webster
, Zhipeng Wang
, Xiaoran Zheng
,
Suresh D. Kulkarni
, Rajendra B. Venkataramana
, Jan Seidel
*
, Pankaj Sharma
*
*
Corresponding author for this work
Manipal Institute of Applied Physics (MIAP)
Research output
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Article
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peer-review
7
Citations (Scopus)
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3
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INIS
boundary conditions
20%
control
100%
cost
20%
defects
40%
devices
40%
distribution
20%
dynamics
20%
electric fields
40%
electrons
20%
electrostatics
20%
environment
20%
equilibrium
20%
fatigue
20%
ferroelectric materials
100%
growth
20%
interfaces
20%
ions
20%
irradiation
20%
kinetics
20%
losses
20%
mapping
20%
microscopy
20%
oxygen
20%
performance
40%
polarization
100%
probes
20%
pyrolysis
20%
retention
20%
space
20%
sprays
20%
stimuli
40%
strains
20%
temperature range 0273-0400 k
40%
thin films
40%
transmission
20%
vacancies
20%
x-ray photoelectron spectroscopy
20%
Material Science
Bismuth Ferrite
100%
Ferroelectric Material
100%
Ferroelectric Thin Films
33%
Oxygen Vacancy
33%
Scanning Probe Microscopy
33%
Spray Pyrolysis
33%
Thin Films
33%
X-Ray Photoelectron Spectroscopy
33%
Engineering
Real Space
50%