INIS
afm
14%
atomic force microscopy
14%
copper oxides
100%
deposition
28%
films
42%
flow rate
100%
grain size
14%
investigations
14%
morphology
14%
optical properties
100%
oxidation
14%
oxides
14%
oxygen
100%
sputtering
100%
surfaces
14%
thin films
100%
variations
28%
x-ray diffraction
14%
Chemistry
Analytical Method
14%
Atomic Force Microscopy
28%
Band Gap
14%
Copper Oxide
100%
Crystalline Material
14%
Dioxygen
100%
Flow Kinetics
100%
Grain Size
28%
Liquid Film
100%
Magnetron Sputtering
100%
Optical Property
100%
Oxidation Reaction
14%
Oxide
14%
Rate
28%
Surface
14%
X-Ray Diffraction
14%
Material Science
Atomic Force Microscopy
14%
Copper
100%
Crystalline Material
14%
Magnetron Sputtering
100%
Optical Property
100%
Oxidation Reaction
14%
Oxide
100%
Sputtered Film
14%
Surface Morphology
14%
Thin Films
100%
X-Ray Diffraction
14%