Structural and electronic properties of nitrogen ion implanted ultra nanocrystalline diamond surfaces

Enhanced electron field emission (EFE) properties have been observed for nitrogen implanted ultra-nanocrystalline diamond (UNCD) films grown by microwave plasma enhanced CVD. X-ray photoelectron spectroscopy (XPS) measurements show that sp² fraction and C-N bonding increase upon N-implantation and annealing. Significant difference in current-voltage (I-V) curves at the grain and grain boundary has been observed from scanning tunneling spectroscopic (STS) measurement. From the variation of normalized conductance (dI / dV) / (I / V) versus V, bandgap is measured to be 4.8 eV at the grain and 3.8 eV at the grain boundary for as prepared UNCD. Upon nitrogen implantation and annealing, the bandgap decreases for both grain and grain boundary and density of states are introduced in the bandgap. Current imaging tunneling spectroscopy (CITS) imaging shows that the grain boundaries have higher conductivity than the grains and are the prominent electron emitters. The enhancement in EFE properties upon nitrogen implantation is accounted for by the decrease in bandgap, increase in density of states in the bandgap caused by increase in sp² content and new bonds at the diamond grains, and increase in conductivity at the grain boundary.