TY - JOUR
T1 - Structural and Mechanical Analysis of APCVD Deposited Diamond-Like Carbon Thin Films
AU - Ghadai, Ranjan Kumar
AU - Das, Soham
AU - Kalita, Kanak
AU - Swain, Bibhu Prasad
AU - Davim, João Paulo
N1 - Publisher Copyright:
© 2020, Springer Nature B.V.
PY - 2021/12
Y1 - 2021/12
N2 - In this study, diamond-like Carbon (DLC) thin film coatings are deposited by atmospheric pressure chemical vapour deposition (APCVD) process by using C2H2 and H2 as precursor gases on SiO2 substrates. The morphological, structural, mechanical and composition of the DLC thin film coatings are studied by using field emission scanning electron microscopy (FESEM), Raman spectroscopy, nanoindentation, Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Irrespective of the varying H2 flow rate, smooth surfaces of the thin film coatings are observed in the FESEM images. The Young’s modulus (E) and hardness (H) of the DLC coating increases with an increase in H2 flow rate and the maximum E and H are observed as 193.97 GPa and 22.46 GPa respectively. Due to the SiO2 buffer layer, the residual stress (σ) of the film significantly decreased to a minimum of 1.05 GPa which is much less as compared to the DLC film deposited over the Si substrate. The percentage of sp3 can be calculated from the XPS and it is 58.68% and 70% for the flow rate of H2 of 0 and 80 sccm respectively. The effect of H2 flow rate on the morphology, structural, mechanical and composition of the DLC thin film coatings are analyzed and discussed thoroughly along with mechanics behind it.
AB - In this study, diamond-like Carbon (DLC) thin film coatings are deposited by atmospheric pressure chemical vapour deposition (APCVD) process by using C2H2 and H2 as precursor gases on SiO2 substrates. The morphological, structural, mechanical and composition of the DLC thin film coatings are studied by using field emission scanning electron microscopy (FESEM), Raman spectroscopy, nanoindentation, Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Irrespective of the varying H2 flow rate, smooth surfaces of the thin film coatings are observed in the FESEM images. The Young’s modulus (E) and hardness (H) of the DLC coating increases with an increase in H2 flow rate and the maximum E and H are observed as 193.97 GPa and 22.46 GPa respectively. Due to the SiO2 buffer layer, the residual stress (σ) of the film significantly decreased to a minimum of 1.05 GPa which is much less as compared to the DLC film deposited over the Si substrate. The percentage of sp3 can be calculated from the XPS and it is 58.68% and 70% for the flow rate of H2 of 0 and 80 sccm respectively. The effect of H2 flow rate on the morphology, structural, mechanical and composition of the DLC thin film coatings are analyzed and discussed thoroughly along with mechanics behind it.
UR - https://www.scopus.com/pages/publications/85092737955
UR - https://www.scopus.com/pages/publications/85092737955#tab=citedBy
U2 - 10.1007/s12633-020-00760-3
DO - 10.1007/s12633-020-00760-3
M3 - Article
AN - SCOPUS:85092737955
SN - 1876-990X
VL - 13
SP - 4453
EP - 4462
JO - Silicon
JF - Silicon
IS - 12
ER -