Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

Soham Das; Spandan Guha; Ranjan Ghadai; Dhruva Kumar; Bibhu P. Swain

doi:10.1007/s00339-017-1032-0

Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

Soham Das, Spandan Guha, Ranjan Ghadai, Dhruva Kumar, Bibhu P. Swain^*

^*Corresponding author for this work

Department of Mechanical & Industrial Engineering Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Article › peer-review

42 Citations (Scopus)

Abstract

Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO₂ powder, Al powder and N₂ gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm⁻¹ for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.

Original language	English
Article number	412
Journal	Applied Physics A: Materials Science and Processing
Volume	123
Issue number	6
DOIs	https://doi.org/10.1007/s00339-017-1032-0
Publication status	Published - 01-06-2017

All Science Journal Classification (ASJC) codes

General Chemistry
General Materials Science

Access to Document

10.1007/s00339-017-1032-0

Cite this

@article{da1e4abbf8ea4b33b9e071e22aac4ab7,

title = "Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films",

abstract = "Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.",

author = "Soham Das and Spandan Guha and Ranjan Ghadai and Dhruva Kumar and Swain, \{Bibhu P.\}",

note = "Publisher Copyright: {\textcopyright} 2017, Springer-Verlag Berlin Heidelberg.",

year = "2017",

month = jun,

day = "1",

doi = "10.1007/s00339-017-1032-0",

language = "English",

volume = "123",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

number = "6",

}

TY - JOUR

T1 - Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

AU - Das, Soham

AU - Guha, Spandan

AU - Ghadai, Ranjan

AU - Kumar, Dhruva

AU - Swain, Bibhu P.

PY - 2017/6/1

Y1 - 2017/6/1

N2 - Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.

AB - Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.

UR - https://www.scopus.com/pages/publications/85019456581

UR - https://www.scopus.com/inward/citedby.url?scp=85019456581&partnerID=8YFLogxK

U2 - 10.1007/s00339-017-1032-0

DO - 10.1007/s00339-017-1032-0

M3 - Article

AN - SCOPUS:85019456581

SN - 0947-8396

VL - 123

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 6

M1 - 412

ER -

Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this